发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND COLOR FILTER USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which performs good photosensitivity in exposure, leaves no scum on a substrate in its unexposed portion and on a black matrix after development, and improves the heat resistance of a color filter made from the composition. <P>SOLUTION: The photosensitive resin composition for color filters comprises: (A) an alkali-soluble resin; (B) a polymerizable compound having an ethylenically unsaturated bond; (C) a photopolymerization initiator; (D) an organic solvent; and (E) a colorant, wherein the polymerizable compound (B) having an ethylenically unsaturated bond is a polymerizable compound having, within its molecule, one or more carboxyl groups and at least 7 functional groups represented by formula (1) (wherein R<SP>1</SP>represents H or methyl). A color filter obtained using the composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007279720(A) 申请公布日期 2007.10.25
申请号 JP20070081391 申请日期 2007.03.27
申请人 CHI MEI CORP 发明人 HSU JUNG-PIN;RIN HAKUSEN;SEI BAIKA
分类号 G02B5/20;G03F7/004 主分类号 G02B5/20
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