发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method capable of preventing substrates contained in a substrate container from being sucked each other in the case of lifting up the substrate container from a processing tank. SOLUTION: In the substrate processing apparatus including: the substrate containers each having a plurality of support grooves at the inside of its opposed side parts and an opening at its bottom; the processing tank for storing its inside a processing liquid, wherein the substrate containers each supporting a plurality of substrates to the support grooves longitudinally in parallel are immersed into the processing liquid stored in the processing tank to process the substrates at the same time, the processing tank includes at its bottom one ore more support fixtures each upwards convex and whose lower ends of the substrates at the lower ends of the substrates, the opening at the bottom of each substrate container is inserted to the support fixture so that the substrates supported by each substrate container can be lifted up and supported at the same time. The technology above includes the substrate processing method using the substrate processing apparatus. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007281342(A) 申请公布日期 2007.10.25
申请号 JP20060108597 申请日期 2006.04.11
申请人 SHIN ETSU HANDOTAI CO LTD;SHIN ETSU CHEM CO LTD 发明人 TAKAHASHI MASATOSHI;HARA KAZUO;OTSUKA HIROYUKI;ISHIKAWA NAOKI
分类号 H01L21/304;B08B3/02;B08B3/10;B08B3/12;H01L21/027;H01L21/306 主分类号 H01L21/304
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