| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor phase growth device capable of preventing malfunction of an encoder that monitors rotational speed of a rotor unit and to provide its method. SOLUTION: The vapor phase growth device comprises a process furnace 102, a gas introducing opening 104 which is formed in the process furnace 102 for guiding a film forming gas into the process furnace 102, a gas exhausting opening 106 which is formed in the process furnace 102 for exhausting the film forming gas, a holder 110 in which a wafer is placed and is positioned in the process furnace 102, a rotor unit 112 where the holder 110 is arranged on its upper surface, a rotational mechanism part 120 positioned under the process furnace 102 to rotate the rotor unit 112, an encoder 126 positioned in the rotational mechanism part 120 to monitor the rotational speed of the rotor unit 112, a purge gas introducing pipe 132 for purging the inside of the encoder 126, and a purge gas exhausting pipe 134 which exhausts the gas introduced by the purge gas introducing pipe 132. COPYRIGHT: (C)2008,JPO&INPIT
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