发明名称 Laser apparatus, laser irradiation method, semiconductor manufacturing method, semiconductor device, and electronic equipment
摘要 Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight line; and an optical system for processing laser light that is outputted from the laser oscillator to irradiate with the laser light a certain region within the moving range of the process object. The laser apparatus is characterized in that the certain region is on a line extended from the straight line and that the position at which the certain region overlaps the process object is moved by rotating the process object while moving the center of the rotation along the straight line.
申请公布号 US2007246664(A1) 申请公布日期 2007.10.25
申请号 US20070812557 申请日期 2007.06.20
申请人 YAMAZAKI SHUNPEI;TANAKA KOICHIRO;MIYAIRI HIDEKAZU;SHIGA AIKO;SHIMOMURA AKIHISA;AKIBA MAI 发明人 YAMAZAKI SHUNPEI;TANAKA KOICHIRO;MIYAIRI HIDEKAZU;SHIGA AIKO;SHIMOMURA AKIHISA;AKIBA MAI
分类号 G01N21/00;B23K26/08;H01L21/20;H01L21/77;H01L27/32 主分类号 G01N21/00
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