发明名称 PROCESS AND DEVICE WHICH PREVENT CARBON MONOXIDE POISONING IN PERIPHERAL EDGE OF SUBSTRATE IN THIN-FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a method and device which prevent carbon monoxide poisoning of a thin metal film formed on a substrate by use of a metal carbonyl precursor. SOLUTION: The thin metal films 840 and 860 are formed on substrates 25 and 125 mounted on the thin-film deposition systems 1,100 and the substrate holders 20 and 120. The substrate holders 20 and 120 have protective rings 21 and 124 which are mounted in the peripheral edges of the substrate holders 20 and 120 and surrounds the peripheral edges of substrates 25 and 125. The protective rings 21 and 124 prevent formation of CO by-product in the peripheral edges of substrates 25 and 125. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007277719(A) 申请公布日期 2007.10.25
申请号 JP20070084912 申请日期 2007.03.28
申请人 TOKYO ELECTRON LTD;TOKYO ELECTRON AMERICA INC 发明人 SUZUKI KENJI;GOMI ATSUSHI;HARA MASAMICHI;MIZUSAWA YASUSHI
分类号 C23C16/16;C23C16/455;H01L21/28;H01L21/285 主分类号 C23C16/16
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