发明名称 |
Resist composition, method for forming resist pattern using the same, array substrate fabricated using the same and method of fabricating the array substrate |
摘要 |
A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin. |
申请公布号 |
US2007246441(A1) |
申请公布日期 |
2007.10.25 |
申请号 |
US20070790062 |
申请日期 |
2007.04.23 |
申请人 |
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发明人 |
KIM JIN WUK;NAM YEON HEUI |
分类号 |
C23F1/00;B44C1/22;G03C5/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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