A METHOD FOR REPAIRING PHOTOMASK

摘要

A method for repairing a photomask is provided to allow the defect parts to be removed at a time and to be repaired at a time, thereby reducing the repairing time. A method for repairing a photomask comprises the steps of forming a first photoresist(30) on a light transparent part(21) and a light nontransparent part(23) of a photomask; exposing the first photoresist so as to allow the part where additional pattern(25) is inserted to be exposed and developing it to form a space part; forming a repair material layer(50) on the space part and the first photoresist; and removing the photoresist and the repair material layer formed on the first photoresist by lift-off method.