| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad which detects the optical end point with high accuracy in the process of polishing, and prevents leakage of slurry from between a polishing area and a light transmission area even in a long-time use, and also to provide a manufacturing method of the pad. <P>SOLUTION: In the polishing pad, the polishing area 8 having an opening part 10 and a cushion layer 12 having an opening part 11 are stacked such that the opening part 10 and the opening part 11 are superposed one on the other, a permeability preventing member 13 for closing the opening is provided in the opening part 11 by self-bonding, and in the opening part 10, the light transmission area 9 is directly provided on the permeability preventing member. <P>COPYRIGHT: (C)2008,JPO&INPIT |
