| 摘要 |
PROBLEM TO BE SOLVED: To provide a spin coat apparatus capable of reducing nonuniformity of a film thickness generated when a viscosity of a used solution is low and increasing the film thickness without nonuniformity of the film thickness even in a solution of a low concentration in a spin coat film formation on a substrate having a recession/projection, and a spin coat method. SOLUTION: The inside of a fully closed structure is previously made to a dried atmosphere by an inert gas introduction line, thereby, a solvent can be quickly dried during spin coating. As a result, when the spin coating is performed on the substrate with the recession/projection, generation of nonuniformity of the film thickness can be prevented by volatilizing the solvent at the time when the solution is reduced until an influence of the recession/projection is received. Further, even if the spin coating is performed at a high speed rotation so as to reduce nonuniformity of the film thickness in the spin coating of the solution of the low concentration, the sufficient film thickness can be ensured since volatilization of the solvent is fast. COPYRIGHT: (C)2008,JPO&INPIT
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