| 摘要 |
<p>A semiconductor and a photomask for display panel are provided to form correct and accurate patterns by reducing an error rate in an exposure process by uniformly adhering a film mask and a glass board based on light transparent efficiency. A film mask(110) includes a constant pattern which is formed by a laser floating process and an exposure process. A light-transmitting adhesive layer(120) performs a medium function to attach uniformly the film mask on a glass substrate(130). The glass substrate is coupled to the film mask through the light-transmitting adhesive layer. The film mask is formed with a transparent PET(Poly Ethylene Terephthalate) film, a protective layer, a photosensitive layer, a scattered light absorbing layer, an antistatic layer, and a back coating layer. The film mask is formed by performing an exposure process after printing a constant pattern by performing a laser floating process using a CAD/CAM program on a surface the protective layer.</p> |
