Lithographic apparatus and device manufacturing method
摘要
Apparatus and methods for compensating for the movement of a substrate (W) in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror (10) configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
申请公布号
EP1847877(A2)
申请公布日期
2007.10.24
申请号
EP20070015576
申请日期
2006.11.28
申请人
ASML NETHERLANDS B.V.;ASML HOLDING N.V.
发明人
VISSER, HUIBERT;CALLAN, DAVID WILLIAM;MUNNIG SCHMIDT, ROBERT-HAN;WIENER, ROBERTO B;VAN DE VEN, JOHANNES THEODORUS GUILLELMUS MARIA;ROBBINS, GEORGE HOWARD