发明名称 Extreme UV radiation focusing mirror and extreme UV radiation source device
摘要 In an EUV focusing mirror in which there are several thin concave nested high precision mirrors (a,b,c,d,e) in the form of an ellipsoid of revolution, a paraboloid of revolution, a Wolter type or the like, the sides which do not constitute the reflection surfaces are made in the shape of a knife edge at the radiation incident ends of the respective mirrors in order not to be shielded by the thickness of the radiation incidence sides of the respective mirrors. Likewise, the radiation exit ends of the respective mirrors are made in the form of a knife edge. This yields an advantageous far-field distribution use of the mirrors for an EUV radiation source device and the degree of reduction of the light intensity can be made smaller than in the conventional case.
申请公布号 EP1848004(A2) 申请公布日期 2007.10.24
申请号 EP20070007808 申请日期 2007.04.17
申请人 USHIODENKI KABUSHIKI KAISHA 发明人 KABUKI, KIYOYUKI;SATO, HIROTO
分类号 G21K1/06;G03F7/20 主分类号 G21K1/06
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