| 摘要 |
A test piece for an optoelectronic image analysis systems is disclosed. One embodiment has a planar substrate, on which a plurality of geometrical patterns of differing shapes and/or sizes are arranged in a durable, predetermined surface coverage. The geometrical patterns contrast optically against the substrate. The surface coverage of geometrical patterns on the substrate is provided such that an overlapping of the geometrical patterns is avoided. In addition, a method of fabrication of a test piece is provided, in which a metal film is deposited on a glass/ceramic substrate, subsequently the metal film is exposed according to a predetermined pattern, and finally the film is etched to create the geometrical pattern on the glass/ceramic substrate.
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