发明名称 Method of forming a magnetic tunnel junction
摘要 A method of forming a magnetic tunnel junction memory element and the resulting structure are disclosed. A magnetic tunnel junction memory element comprising a thick nonmagnetic layer between two ferromagnetic layers. The thick nonmagnetic layer has an opening in which a thinner tunnel barrier layer is disposed. The resistance of a magnetic tunnel junction memory element may be controlled by adjusting the surface area and/or thickness of the tunnel barrier layer without regard to the surface area of the ferromagnetic layers.
申请公布号 US7284315(B2) 申请公布日期 2007.10.23
申请号 US20040759078 申请日期 2004.01.20
申请人 MICRON TECHNOLOGY, INC. 发明人 TUTTLE MARK E.
分类号 G11B5/187;B05D5/12;G11C11/16;H01F10/32;H01F41/30;H01L27/22;H01L43/08;H01L43/12 主分类号 G11B5/187
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