| 摘要 |
A planar pattern ( 11 ), having a plurality of apertures of the same size (WxxWy), is determined by a two-dimensional layout determination tool ( 10 ), and a three-dimensional structure, having a depth d and an undercut amount Uc for making the phase of the transmitted light be shifted by 180 degrees with every even-numbered aperture, is determined by a three-dimensional structure determination tool ( 20 ). Simulation of transmitted light is executed for a structural body having the planar pattern ( 11 ) and the three-dimensional structure ( 21 ) by a three-dimensional simulator ( 30 ) to determine the light intensity deviation D of transmitted light for an odd-numbered aperture without a trench and an even-numbered aperture with a trench. At a two-dimensional simulator ( 40 ), simulations using a two-dimensional model prepared based on this deviation D are performed to determine a correction amount delta for making the deviation D zero and obtain a new planar pattern ( 12 ). The work load spent on designing a trench-type, Levenson-type phase shift mask can be lightened and the working time for the designing process can be shortened.
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