RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING THIS

摘要

A photosensitive composition, and a method for preparing a pattern by using the composition are provided to form a pattern on a polymer by the irradiation of UV rays without the coating and etching processes of a photoresist. A photosensitive composition comprises an oligomer having a weight average molecular weight of 500-10,000 obtained by the hydrolysis polymerization of a silane represented by R-CH2CH1CH2Si(OR')3, and a photoinitiator containing a benzoyl group generating a free radical by the irradiation of UV rays of 365 nm or more, in a ratio of 1 : 0.01-20 by weight, wherein R is a vinyl group, an aryl group, an acyloxy group, or a methacryloxy group; and R' is a methyl group, an ethyl group, or an acetoxy group.