| 摘要 |
<p>A material for forming a pattern which has a support and at least a photosensitive layer formed on the support, wherein the support has a haze value of 5.0 % or less, the photosensitive layer comprises a binder, a polymerizable compound and a photopolymerization initiator, and the above polymerizable compound comprises a compound having one polymerizable group in its molecule or a compound having three or more polymerizable groups in its molecule, and wherein when the above photosensitive layer is subjected to an exposure to a light and to a development, the minimum energy of the light used for the above exposure which does not cause the change of the thickness of the part to be exposed of the photosensitive layer after the exposure and the development is 0.1 to 20 mJ/cm^2.</p> |
