| 摘要 |
A substrate processing apparatus is provided to exhaust a process gas from a process chamber uniformly by extending a first gas exhaust pipe in parallel with an upper surface of the process chamber and to perform a process stably by uniformly distributing gas inside the process chamber. A substrate processing apparatus includes a process chamber(210), in which a substrate is processed, and a gas exhaust part(230) for exhausting the process gas from the process chamber. The gas exhaust part has a first gas exhaust pipe(232) with plural gas inlet ports(234) through which the process gas passes from the process chamber, and a second gas exhaust pipe connected to the first gas exhaust pipe for exhausting the process gas from the first gas exhaust pipe.
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