发明名称 |
LITHOGRAPHY PROCESSES USING PHASE CHANGE COMPOSITIONS |
摘要 |
<p>A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.</p> |
申请公布号 |
KR20070102658(A) |
申请公布日期 |
2007.10.19 |
申请号 |
KR20077007891 |
申请日期 |
2005.09.23 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
CHEN WEI;HARKNESS BRIAN ROBERT;SUDBURY HOLTSCHLAG JOAN;PETROFF LENIN JAMES |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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