METHOD FOR FABRICATION MICRO-LENS AND MICRO-LENS INTEGRATED OPTOELECTRONIC DEVICES USING SELECTIVE ETCH OF COMPOUND SEMICONDUCTOR

摘要

A method for fabricating a micro-lens and a micro-lens integrated optoelectronic device using selective etching of a compound semiconductor are provided to simplify a manufacturing process and reduce packaging cost of an optical communication or interconnection system by integrating the micro-lens without a photolithography process. A method for fabricating a micro-lens includes the steps of: forming a compound semiconductor layer having a reactive metal material on a substrate(100); forming a compound semiconductor layer pattern by etching the compound semiconductor layer; and forming a lens layer(150) by partially removing the side of the compound semiconductor layer pattern. The compound semiconductor layer is composed of a reaction layer having the reactive metal material, and a semiconductor layer without the reactive metal material. The density of the reactive metal material gets higher as it goes to the upper part of the compound semiconductor layer.