发明名称 Incrementally Resolved Phase-Shift Conflicts In Layouts For Phase-Shifted Features
摘要 Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.
申请公布号 US2007245291(A1) 申请公布日期 2007.10.18
申请号 US20070766047 申请日期 2007.06.20
申请人 SYNOPSYS, INC. 发明人 WU SHAO-PO;WANG YAO-TING
分类号 G06F17/50;G03F1/00 主分类号 G06F17/50
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