| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a resist film on a large substrate for a display device by which a resist film free of such unevenness in application as to cause a problem in practical use can be efficiently formed on a large substrate for a display device, and also to provide a photosensitive resin composition for use in the forming method. <P>SOLUTION: The method for forming a resist film on a large substrate for a display device includes a step of forming a resist film by carrying out application and reduced-pressure drying of the photosensitive resin composition comprising an alkali-soluble resin, a photosensitizer and a solvent on a large substrate for a display device, and a step of heating the large substrate on which the resist film has been formed under ordinary pressure. The photosensitive resin composition satisfies predetermined conditions when vapor pressures at 22°C and 25°C in the case where the composition has a solid concentration of 70 wt.%, and a vapor pressure at 25°C in the case where the composition has a solid concentration of 90 wt.%, are calculated using a process simulator. <P>COPYRIGHT: (C)2008,JPO&INPIT |
