INORGANIC PARTICLES ETCHED THE SURFACE USING HIGH ENERGY SOURCE BY ACIDS TREATMENT AND AN ETCHING METHOD THEREOF

摘要

A method for etching the surfaces of inorganic particles by acid treatment using a high energy source is provided to control gloss and feeling of use in the inorganic particles. A method for etching the surfaces of inorganic particles by acid treatment using a high energy source includes the steps of: (1) adding inorganic particles into an acid, and stirring the admixture to prepare slurry; and (2) applying a high energy source to the slurry, and washing, filtering, drying, and grinding the inorganic particles. The acid is at least one selected from the group consisting of hydrofluoric acid, nitric acid, acetic acid, hydrochloric acid, and phosphoric acid. The high energy source is at least one selected from the group consisting of microwave energy, ultrasonic energy, plasma, and heating.