| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a highly sensitive photoacid generation system usable in a laser direct imaging technology, etc., and free from oxygen inhibition effect and having high freedom as a photoinitiating system. <P>SOLUTION: The invention provides a highly sensitive sensitized photoacid generation material causing photoelectron transfer by a sensitizing agent and an oxime-based photoacid generator and starting the reaction from radical anion of the oxime-based photoacid generator, a highly sensitive sensitized photoacid generation material containing a pyrromethene as a sensitizing agent and an oxime-based photoacid generator, an oxime-based photoacid generator generating radical anion from the oxime-based photoacid generator molecule by photoelectron transfer reaction, etc., to localize the radical spin density near an N-O bond and generate a bond cleavage in high efficiency, a photolithographic material containing the highly sensitive photoacid generation material, and photopatterning method and photolithographic method using the same. <P>COPYRIGHT: (C)2008,JPO&INPIT |
