| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a new technique capable of easily adjusting a resistance value of a heating element in a thin-film thermal print head formed by CVD or sputtering after forming the heating element. <P>SOLUTION: A method for adjusting a resistance value of a heating element in a thin-film thermal print head is provided in which a partial glaze with a predetermined width extending in a main scanning direction is formed on an insulating substrate, a plurality of thin-film resistance elements traversing this partial glaze at the predetermined width and disposed in the main scanning direction are formed on this partial glaze by CVD or sputtering, and a conductive layer is formed so as to expose the thin-film resistance elements over a predetermined range on a top of the partial glaze, whereby an exposed portion of the thin-film resistance elements is made to be the plurality of heating elements aligned in the main scanning direction, wherein excimer laser is irradiated so that a resistance value of each of the heating elements becomes a desired resistance value. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
