| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask blank suitable to a photomask for FPD, and the photomask. <P>SOLUTION: The mask blank 10 is for manufacturing an FPD device, and has a substrate 12, a light shield film 14 formed on the substrate 12 by using metal silicide as a material, and an upper-layer film 16 formed on the light shield film 14 by using a material containing chromium. The light shield film 14 and upper-layer film 16 are films to be wet-etched by using an etching mask obtained by patterning a resist film 18 formed on the upper-layer film 16, and the resist film 18 is formed by discharging resist liquid onto the upper-layer film 16 from a nozzle having a resist liquid supply hole extending in one direction and also simultaneously moving the nozzle in a direction crossing the one direction relatively to the upper-layer film surface. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
