| 摘要 |
A substrate treatment apparatus is provided with a treatment bath (1) composed of a bottomed container which is surrounded by side walls (2b-2e) on the four sides and is open at the top, and first and second supplying nozzle tubes (10a-10d) which supply the treatment bath (1) with a treatment solution. The first and second supplying nozzle tubes (10a-10d) are composed of supplying nozzle tubes having a plurality of jetting ports (11) arranged on one line at prescribed intervals on each side plane in a longitudinal direction of the hollow tube-shaped body. The jetting ports of the first supplying nozzle tubes (10b, 10d) among the nozzle tubes are inclined diagonally downward at a prescribed angle from the horizontal direction, the jetting ports of the second supplying nozzle tubes (10a, 10c) are inclined diagonally upward at a prescribed angle from the horizontal direction, and the supplying nozzle tubes are arranged substantially horizontal at prescribed intervals on one side wall plane (2b) of the treatment bath (1). Stagnation of the treatment solution in the treatment bath is eliminated, uniform substrate treatment is made possible and furthermore, particle removal is facilitated. |
