发明名称 BIMOLECULAR FILM FORMING APPARATUS AND BIMOLECULAR FILM FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem, wherein a bimolecular film, manufactured by a conventional technique, has not been controlled with respect to film area and to the stability related to the electrical physical properties. <P>SOLUTION: This bimolecular film forming apparatus is equipped with a bimolecular film forming part 1 for applying AC voltage, which has an arbitrary frequency formed by an AC voltage applying device 2 and keeps the current component excluded or minimized, to the bimolecular film 7 to variably control the film area of the bimolecular film 7 and grasping the film state of the bimolecular film 7 by an observation part 4 for performing the observation due to the electrochemical signal of the bimolecular film 7 and/or the optical observation of the bimolecular film 7 to form and keep the bimolecular film 7, having a desired film area by the frequency control of the applied AC voltage. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007271371(A) 申请公布日期 2007.10.18
申请号 JP20060095354 申请日期 2006.03.30
申请人 TOSHIBA CORP;ECG KOKUSAI CO LTD 发明人 UCHIDA HIROSHI;NORITOMI YASUKO;KANEHARA TAKESHI;KAWANO KOICHIRO
分类号 G01N27/327;G01N21/17;G01N27/02;G01N27/22;G01N27/416 主分类号 G01N27/327
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