| 摘要 |
PROBLEM TO BE SOLVED: To realize high-speed and high-voltage operations of an electrostatic deflector, without causing increase with respect to the load on a deflection amplifier, and to consequently improve the drawing speed. SOLUTION: The charged particle beam drawing device deflects charged beams generated from a charged beam source by the electrostatic deflector and draws patterns by irradiating a desired position on a sample with the charged beam. The electrostatic deflector is provided with several deflecting electrodes 51, which are arranged symmetric with respect to an optical axis of the charged beam, a grounding outer case 52 which is arranged so as to surround the deflecting electrodes 51, a resistor film 53 arranged on the inner surface of the grounding outer case 52 and a conductive film arranged on the surface of the resistor film 53. Capacitance is formed between the deflecting electrodes 51 and the conductive film, and electrical resistance is formed between the grounding outer case 52 and the conductive film. COPYRIGHT: (C)2008,JPO&INPIT
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