发明名称 |
PHOTOCURABLE RESIN COMPOSITION FOR BATCH FORMATION OF DIFFERENT MEMBERS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photocurable resin composition having good alkali developability and suitable for use in batch formation of a plurality of patterns in a display device or the like with a photomask. <P>SOLUTION: The photocurable resin composition for batch formation of different members comprises: an acidic functional group-containing copolymer comprising a constitutional unit having an acidic functional group and a constitutional unit having a photopolymerizable functional group; an acidic functional group-containing polyfunctional monomer having an acidic functional group and a plurality of photopolymerizable functional groups; and an acidic functional group-containing epoxy resin comprising a constitutional unit having an acidic functional group and a constitutional unit having an epoxy group. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007271994(A) |
申请公布日期 |
2007.10.18 |
申请号 |
JP20060098327 |
申请日期 |
2006.03.31 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
HINO KAZUYUKI;KAWAGUCHI SHUJI;SUMINO TOMONOBU |
分类号 |
G03F7/038;C08F290/04;C08G59/40;G02B5/20;G03F7/027;G03F7/032;G03F7/11 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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