| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a plasma display front substrate capable of solving a problem where, when photolithography or an etching process is applied, a manufacturing process is long and complicated, facility expense and running cost are high, and an environmental load is heavy, and a problem where, when a laser patterning method is used, pattern formation accuracy and productivity are low. SOLUTION: This manufacturing method of a transparent substrate with transparent electrodes includes a process for forming the electrodes on the transparent substrate by forming films by using a mask 20 having a plurality of openings 22. In the mask, the shapes of the plurality of openings are nearly oblong; the plurality of openings are independent of one another without being connected to one another, and arranged in a matrix-like shape in an optional direction on the mask and in a direction perpendicular to it; and, in all the openings on the mask, sides, facing each other, of the openings adjacent to each other in the row direction are parallel to each other. COPYRIGHT: (C)2008,JPO&INPIT
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