发明名称 A REDUCED CONTAMINANT GAS INJECTION SYSTEM AND METHOD OF USING
摘要 <p>A gas injection system includes a diffuser to distribute a process gas in a processing chamber. The gas injection system may be utilized in a polysilicon etching system involving corrosive process gases.</p>
申请公布号 WO2007117741(A2) 申请公布日期 2007.10.18
申请号 WO2007US61041 申请日期 2007.01.25
申请人 TOKYO ELECTRON LIMITED;ENOMOTO, TAKASHI;HAGIHARA, MASAAKI;KO, AKITERU;HAMAMOTO, SHINJI;URAKAWA, MASAFUMI;LAFLAMME, ARTHUR, H., JR.;HELLER, EDWARD 发明人 ENOMOTO, TAKASHI;HAGIHARA, MASAAKI;KO, AKITERU;HAMAMOTO, SHINJI;URAKAWA, MASAFUMI;LAFLAMME, ARTHUR, H., JR.;HELLER, EDWARD
分类号 H01L21/306;B05D5/12;C23F1/00;H01M4/88 主分类号 H01L21/306
代理机构 代理人
主权项
地址