发明名称 SOLUTION FILM FORMATION METHOD AND APPARATUS FOR REMOVING DEPOSIT
摘要 PROBLEM TO BE SOLVED: To provide a solution film formation method for removing a deposit attached to a surface of a substrate immediately after stripping a cast film from the substrate. SOLUTION: The solution film formation method is provided in which a drum cleaning machine 65 having a nozzle 66 is placed on an upstream side in a rotation direction of a cast drum 32 from a stripping roller 34, a dope 21 is cast on a surface of the cast drum 32 using a cast die 30, the cast drum 32 is rotated to form a cast film 33 on the surface of the cast drum 32, the cast film 33 is cooled on the cast drum 32, a deposit containing a fatty acid ester as a main component is deposited on the surface of the cast drum 32 from the cast film 33, the stripping roller 34 strips the cast film 33 as a wet film 38, and the drum cleaning machine 65 sprays a mixture gas consisting of air and a dry ice particle on the surface of the cast drum 32 from the nozzle 66. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007269013(A) 申请公布日期 2007.10.18
申请号 JP20070047027 申请日期 2007.02.27
申请人 FUJIFILM CORP 发明人 YOKOYAMA KAZUMASA;TAKEDA AKIRA
分类号 B29C41/26;B29C41/34;B29K1/00;B29L7/00;G02B5/30 主分类号 B29C41/26
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