发明名称 |
METHOD OF CONCURRENTLY PATTERNING A SUBSTRATE HAVING A PLURALITY OF FIELDS AND ALIGNMENT MARKS |
摘要 |
<p>A method of patterning a substrate comprising first and second fields with a template, the template having a mold and a plurality of alignment forming areas and a plurality of template alignment marks, the method comprising: positioning a material on the first field of the substrate and a plurality of regions of the substrate, the plurality of regions laying outside of the first and second fields; positioning the mold and the substrate such that a desired spatial relationship between the mold and the first field of the substrate is obtained to define a pattern in the material on the first field of the substrate while concurrently defining a plurality of substrate alignment marks with the material in the plurality of regions of the substrate in superimposition with the plurality of alignment forming areas of the template; positioning a material on the second field of the substrate; and positioning the mold and the substrate to obtain a desired spatial relationship between the plurality of template alignment marks and the plurality of substrate alignment marks such that a desired spatial relationship between the mold and the second field of the substrate is obtained to define a pattern in the material on the second field of the substrate.</p> |
申请公布号 |
WO2007117524(A2) |
申请公布日期 |
2007.10.18 |
申请号 |
WO2007US08434 |
申请日期 |
2007.04.03 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SREENIVASAN, SIDLGATA V.;MCMACKIN, IAN M.;CHOI, BYUNG-JIN;MELLIAR-SMITH, CHRISTOPHER M. |
分类号 |
B29C43/02 |
主分类号 |
B29C43/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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