发明名称 METHOD OF REMOVING DIAMOND COATING
摘要 <p>As shown in Fig. 3, diamond coating (30) is irradiated with oxide ion beams to thereby efficiently etch the diamond coating (30) by both of sputtering phenomenon and oxidation in step S2. Thereafter, in step S3, irradiation with argon ion beams is carried out to thereby etch the diamond coating (30) by sputtering phenomenon only. In this etching by ion beams, the diamond coating (30) can be removed more uniformly than in the use of microwave plasma, so that the danger of partial grave erosion of tool base material (20) can be avoided. Further, the tool base material (20) as it is or after minor rework can be reutilized, and there can be attained inexpensive reproduction of diamond coating working tool (12).</p>
申请公布号 WO2007116522(A1) 申请公布日期 2007.10.18
申请号 WO2006JP307588 申请日期 2006.04.10
申请人 OSG CORPORATION;OSAWA, JIRO;HANYU, HIROYUKI 发明人 OSAWA, JIRO;HANYU, HIROYUKI
分类号 B23K15/00;C23C16/27;B23K101/20;B23P15/28;C23C16/02 主分类号 B23K15/00
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