发明名称 MANUFACTURING METHOD OF THIN FILM MAGNETIC ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of manufacturing a thin film magnetic element with high reliability with simple steps. SOLUTION: The manufacturing method of forming the thin film magnetic element 1 includes: an insulation layer forming step of forming an insulation layer 3 for covering a conductive film 20 patterned in a way that the conductive film 20 is provided on a base 5, and grooves 2 are formed; a magnetic film forming step of forming a magnetic film 41 on the insulation layer 3, and the insulation layer forming step includes the steps of forming a first insulator 31 made of a cured body of a thermosetting resin, and embedding at least part of the grooves 2 with a pattern for exposing at least part of a face S of the conductive film 20 opposite to the base 5; and forming a second insulator 32 for covering the first insulator 31 and the conductive film 20. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007273870(A) 申请公布日期 2007.10.18
申请号 JP20060099710 申请日期 2006.03.31
申请人 TDK CORP 发明人 SAI KIYOUHISA
分类号 H01F41/04 主分类号 H01F41/04
代理机构 代理人
主权项
地址