APPARATUS FOR ROTATING AND HOLDING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS EQUIPPED THEREWITH, AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for holding and rotating a substrate with a simple configuration which can uniformly process the entire external circumferential end surface of a substrate and can rotate the substrate at a high speed, and to provide a substrate processing apparatus with the same and a substrate processing method. SOLUTION: Holding pins 23 each have a pin fixing plate 51. A pin member 53 is provided on the pin fixing plate 51. The pin member 53 consists of a columnar pedestal member 54, a bar-like shaft member 55 extending in a vertical direction and a roller pin 56. The roller pin 56 is freely rotatably attached on the shaft member 55. A V-shaped groove 56a is formed across the circumferential direction on the external circumferential surface of the roller pin 56, and the external circumferential end surface of the substrate W is supported by the groove 56a. The pin fixing plate 51 is freely rotatably attached on a link 58 via a coupling member 57. The link 58 is provided inside a spin base 22. COPYRIGHT: (C)2008,JPO&INPIT