Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system

摘要

A method for operating a Cartesian-type electron beam (e-beam) lithography (EBL) tool enables the efficient and precise writing of a closed curvilinear pattern, such as a circle, over a wide area of a workpiece. The curvilinear pattern overlies a plurality of contiguous fields of the EBL tool's x-y positioning stage, and the stage is moved along a path defined by the contiguous fields. Alignment marks associated with the first and next-to-last fields are formed on the specimen. The alignment marks are used to adjust the shape of the last field so that when the e-beam is scanned in the last field there is a substantially continuous connection of the pattern between the next-to-last field and the first field. The invention is particularly applicable to making a master disk with concentric circular tracks for nanoimprinting patterned magnetic recording disks.