METHOD OF FORMING NANOSCALE FEATURES USING SOFT LITHOGRAPHY
摘要
<p>The present invention provides a method of forming a molecular membrane using soft lithography. The method includes forming a pattern having at least one nanoscale feature in a moldable polymer composition and deploying at least a portion of the pattern adjacent a first substrate.</p>
申请公布号
WO2007117808(A2)
申请公布日期
2007.10.18
申请号
WO2007US63644
申请日期
2007.03.09
申请人
DOW CORNING CORPORATION;SHIM, ANNE;ROGERS, JOHN;HUA, FENG;FA, KEQING;BOHN, PAUL
发明人
SHIM, ANNE;ROGERS, JOHN;HUA, FENG;FA, KEQING;BOHN, PAUL
