CLEANING COMPOSITION

摘要

Disclosed is a cleaning composition used for cleaning a substrate for recording medium, a substrate for photomask or a substrate for flat panel display, at least the surface of which substrate is provided with a metal or glass base material. This cleaning composition contains a copolymerized compound (I) at least satisfying the following conditions (i)-(iii). (i) A constitutional unit A1 derived from an acrylic acid is not less than 20 mol% of the total constitutional units. (ii) The total of the constitutional unit A1 derived from an acrylic acid and a constitutional unit A2 derived from 2-acrylamido-2-methylpropane sulfonic acid is not less than 90 mol% of the total constitutional units. (iii) The ratio between the constitutional unit A1 and the constitutional unit A2 [constitutional unit A1 (mol%) / constitutional unit A2 (mol%)] in the total constitutional units is from 91/9 to 95/5.