发明名称 ELECTRIC RESISTANCE CHANGING ELEMENT, SEMICONDUCTOR DEVICE EQUIPPED WITH ELECTRIC RESISTANCE CHANGING ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a resistance changing element capable of reducing the variation of operating voltage upon forming. <P>SOLUTION: A resistance changing film 4, in which a metal oxide or a metallic oxynitride containing at least either one of Zr and Hf as a principal constituent is provided with fluorite structure, and a pair of first and second electrodes 2, 6 provided so as to pinch the resistance changing film are provided. The crystal structure of the resistance changing film is provided with Bevan cluster in a part or the whole of it and when V shows a vacancy, in which negative ion is not existing in a negative ion site in the fluorite type crystal structure, M shows the metallic element of the metal oxide or the metallic oxynitride and S shows the maximum octahedron type cavity site in the fluorite type crystal structure, the direction of array of a straight chain type continuous chain of (-S-V-M-V-S-) in the unit cell of the Bevan cluster is provided with the direction of crystal substantially orthogonal to the principal surface of the film. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007273548(A) 申请公布日期 2007.10.18
申请号 JP20060094630 申请日期 2006.03.30
申请人 TOSHIBA CORP 发明人 INO TSUNEHIRO;KOIKE MASAHIRO;KOYAMA MASATO
分类号 H01L45/00;H01L21/822;H01L27/04;H01L27/10;H01L49/00 主分类号 H01L45/00
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