| 摘要 |
Lithographic Apparatus, Lens Interferometer and Device Manufacturing Method A lithographic apparatus includes an illumination system that is configured to condition a radiation beam; a projection system that is configured to project at least a portion of the radiation beam as a projected radiation beam; and a lens interferometer for sensing a wavefront state of the projected radiation beam. The lens interferometer is provided with a polarizing element so as to be capable of sensing a polarisation state of the projected radiation beam.
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