发明名称 Exposure apparatus and device manufacturing method
摘要 An exposure apparatus that includes a first optical system having an optical element that separates incident exposure light into a first exposure light and a second exposure light and emits the first exposure light in a first direction and emits the second exposure light in a second direction that differs from the first direction; and a second optical system that irradiates the second exposure light that is emitted from the optical element in the second direction onto the substrate together with the first exposure light that is emitted in the first direction.
申请公布号 US2007242254(A1) 申请公布日期 2007.10.18
申请号 US20070717750 申请日期 2007.03.14
申请人 NIKON CORPORATION 发明人 NAGASAKA HIROYUKI
分类号 G03B27/54 主分类号 G03B27/54
代理机构 代理人
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