| 摘要 |
A method of manufacturing a pixel structure is provided. A gate, a scan line, and at least one first auxiliary pattern are formed on a substrate. A gate insulating layer is formed on the substrate to cover the gate and the scan line and expose the first auxiliary pattern and a part of the scan line. A channel layer is formed on the gate insulating layer over the gate. A source, a drain, a data line, a top electrode, and at least one second auxiliary pattern are formed, wherein the data line is electrically connected to the exposed first auxiliary pattern and the second auxiliary pattern is electrically connected to the exposed scan line. A passivation layer and a pixel electrode are formed, and the pixel electrode is electrically connected to the drain and the top electrode. |
