| 摘要 |
A substrate processing apparatus is provided to control exactly the height of a lift pin by forming an additional insertion groove under the lift pin. A substrate processing apparatus includes a chamber(100), a plurality of lift pins, a pin plate, a driving unit and a fixing unit. The plurality of lift pins(120) are installed in the chamber to control the height of a substrate. The pin plate is installed at inner or outer portions of the chamber to fix the lift pins. The driving unit(136) is used for moving the pin plate up and down. The fixing unit is used for fixing the lift pins to the pin plate. A screw portion is formed at the pin plate corresponding to a periphery of the lift pin. An insertion groove is formed at an end portion of the screw portion. One pair of nuts is used as the fixing unit. A protection cap is installed at an end portion of the lift pin to keep the airtightness.
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