| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating device which prevents operation failure of an exposing device in exposure treatment by a liquid immersion method. SOLUTION: The substrate treating device 500 includes an indexer block 9, a treatment block 10 for reflection prevention films, a treatment block 11 for resist films, a development treatment block 12, a treatment block 13 for resist cover films, a resist cover film removal block 14, and an interface block 15. An exposure device 16 is arranged adjacent to the interface block 15. In the treatment block 13 for resist cover films, operation of each constitution element is detected by a plurality of cameras and sensors. Based on the results, whether or not a resist cover film is formed normally on a substrate W is judged. COPYRIGHT: (C)2008,JPO&INPIT
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