| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition method capable of accurately performing vapor deposition on a part to be subjected to vapor deposition even when a base plate is expanded or contracted. SOLUTION: In the vapor deposition method of performing vapor deposition of an organic substance or an inorganic substance on the base plate by using a mask having opening parts, when performing vapor deposition of the organic substance or the inorganic substance on the base plate via the opening parts of the mask, a distance between the mask and the base plate is adjusted in accordance with relative expansion or contraction with respect to the mask of the base plate. COPYRIGHT: (C)2008,JPO&INPIT
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