SUBSTRATE HOLDER, POLISHER AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate holder, preventing a substrate as a polishing object from being dislocated and achieving stable polishing.

SOLUTION: A top ring 1 includes: a top ring body 2 for holding a wafer and pressing the wafer to a polishing pad 101; and a retainer ring 3 provided on the outer peripheral part of the top ring body 2 to press the polishing pad 101. The retainer ring 3 includes: a piston 406 made of magnetic body; and a ring member 408 having a magnet 420 on the surface thereof abutting on the piston 406.

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