| 摘要 |
PROBLEM TO BE SOLVED: To accurately measure the position of patterns and the patterns by highly precisely matching the patterns over the entire surface of a flat sample without being influenced by the change of a parameter in an electro-optical system due to re-focusing when there is a distortion exceeding the focus depth in the electro-optical system on the flat sample, as to a method and a device for collating the patterns. SOLUTION: This method for collating the patterns has a step to memorize a focus position Z0 by obtaining it when an electron beam is focused on a certain point, a step to obtain a focus position Z1 when the electron beam is focused on the other point, a step to compute an amount of rotationΔR1 and a scaling magnificationΔM1 based on the differenceΔZ between the focus position Z0 and the focus position Z1, a step to form a design data pattern based on the amount of rotationΔR1 and the scaling magnificationΔM1, and a step to measure what is required among the positions and dimensions of the patterns by collating the design data pattern formed with a pattern on an image obtained by focusing the electron beam on the other place. COPYRIGHT: (C)2008,JPO&INPIT
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