<p>Diffusion regions in a standard cell design are bridged across cell boundaries. Shallow trench isolation is reduced and nitride passivation thickness variation is reduced.</p>
申请公布号
WO2007117893(A2)
申请公布日期
2007.10.18
申请号
WO2007US64459
申请日期
2007.03.21
申请人
INTEL CORPORATION;DAVIS, JEFFREY;DODDAMANI, RAJASHRI;JOO, BYUNGHA;NGUYEN, DUC;SURTI, DARSHANA;YIM, EVA
发明人
DAVIS, JEFFREY;DODDAMANI, RAJASHRI;JOO, BYUNGHA;NGUYEN, DUC;SURTI, DARSHANA;YIM, EVA